技術規格:

•功率密度：0.05 – 2.0瓦/平方厘米
•標準工作頻率：925 kHz； 其他頻率可應要求提供
•安裝高度：0.02" – 0.14" （0.5毫米– 3.5毫米）
•過程流體溫度：15°C – 60°C
•所需的處理液取決於基材尺寸和RPM：0.5 – 3.0 lpm
•運行RPM：1–100
•氮氣或CDA吹掃：10 lpm
•使用3個M6內螺紋凸台安裝
•與IMPulse RF電子設備一起使用

適用的製程:

•CMP後清潔
•TSV
•SOIC之前的鍵合清潔
•SU-8開發
•光刻膠剝離
•LIGA流程
•光罩清潔
•蝕刻輔助
•電鍍前清潔
•去除電鍍前的氣泡
•激光後清潔



美國參考專利

6,188,162　 High Power Megasonic Transducer
6,222,305 　Chemically Inert Megasonic Transducers
6,431,908 　Method for Spring Contact & Matching Megasonic Transducers
6,549,860 　Method and Apparatus for Tuning a Megasonic Transducers
6,791,242 　Radial Power Megasonic Transducer
6,882,087 　Uniform Energy Megasonic Transducer Using Vessel as Resonator
6,904,921 　Indium or Tin Bonded Megasonic Transducer Systems
6,946,774 　Segmented Uniform Energy Megasonic Transducer
7,141,917 　Wedge Shaped Uniform Energy Megasonics Transducer >2MHz
7,145,286 　Indium or Tin Bonded Transducers >2MHz

其他專利
162149 　Chemically Inert Megasonic Transducers Taiwan
200216 　radial Power Megasonic Transducer - Taiwan
200200844-9 　Chemically Inert Megasonic Transducers Singapore
200402092-1 　Radial Power Megasonic Transducer - Singapore
10-0681071　　Chemically Inert Megasonic Transducers - Korea