Semiconductor & Package > Equipment > Focus Ion Beam SIR/SPR Mask Repair Machine
Focus Ion Beam SIR/SPR Mask Repair Machine
SIR FIB Mask Repair Tool is developed for repairing defects on photomasks and reticles for semiconductor devices and LCD devices. This system can repair extremely small and complicatedly shaped defects on photomasks, such as phase shift masks and binary masks, with high accuracy.

SIR Device Observation and Photomask Repair
SIR5 Photomask Repair System
SIR5 is a system developed for repairing defects on photomasks and reticles for semiconductor devices. This system can repair extremely small and complicatedly shaped defects on photomasks, such as phase shift masks and binary masks, with high accuracy.

SIR7 Photomask Repair System
SIR7 FIB is designed to repair photomask defects targeting the 65nm semiconductor device node. This system can repair extremely small and complicatedly shaped defects on photomasks, such as phase shift masks and binary masks, with high accuracy.
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