HHT Mask Repair
Hitachi MR Mask Repair Equipment
Model:
SIR FIB Mask Repair Tool is developed for repairing defects on photomasks and reticles for semiconductor devices and LCD devices. This system can repair extremely small and complicatedly shaped defects on photomasks, such as phase shift masks and binary masks, with high accuracy.
| Name： | Mask Repair System | ||||
| Type： | SIR5000 Mask Repair Tool | ||||
| Overview： | SIR5 is a system developed for repairing defects on photomasks and reticles for semiconductor devices. This system can repair extremely small and complicatedly shaped defects on photomasks, such as phase shift masks and binary masks, with high accuracy. | ||||
| Features： | 1. Successfully miniaturized the beam diameter by using an advanced ion optics system. In contrast with past models, it can observe and repair the microscopic defects. 2. Achieved a repair accuracy of 15nm (3&sigma), making highly accurate repair possible. 3. Uses a Windows ® 2000 based operating system and features a newly developed GUI environment. 4. Able to makes observations and repairs using secondary ion images as well as secondary electron images. |
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Specifications
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| Compatible mask size： | Maximum 7.25 inches | ||||
| Ion source： | Ga liquid metal ion source | ||||
| Acceleration voltage： | Maximum 30kV | ||||
| Repair accuracy： | 15nm (3&sigma) | ||||
| Images used for observation and repair： | Secondary ion image, Secondary electron image | ||||
| Minimum width of repairable line ： |
Under 360nm | ||||