Levitech Rapid Thermal Process
Levitor RTP
Model:
The Levitor RTP system is based on the unique concept of fast heating via conduction rather than the conventional method of radiation. Heat (energy) is stored in two massive blocks in close proximity to the wafer. When the blocks and wafer are separated by a very thin gas layer, the energy transfer from the blocks to wafer through this thin gas layer is very efficient, and extremely fast.
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Product features:
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| Device-, pattern-, film-independent heating by heat conduction through gas: ● No pattern effect ● No need to remove back-side films ● Heats up SOI wafers and bulk Si wafers without warping and breakage |
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| Low temperature capabilities:： ● Reproducible and reliable operation below 200°C |
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| Value of Ownership： ● High throughput, which can exceed 60 wfrs/hr per chamber ● Lowest cost for consumables and spares, no lamps, no rotation ● Lowest number of setup and test wafers ● Smallest footprint ● Most energy efficient (steady state <6 kW peak<20 kW) |
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| Ease of Use： ● Quick and easy tune-in to the process of record ● Reliable and fast tool to tool calibration ● Same temperature settings for same target temperature no lamp correction tables or adjustment software ● Fast, repeatable and inherently uniform heat-up and cool-down ● No overshoot, simple temperature control guaranteeing best reproducibility < 1°C ● Zero physical contact during heating, guaranteeing lowest possible stress no scratching |
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| Product spotlight: ● Oxidation ● Silicidation ● RTP for LED |
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