PE Plasma Clean Etch Equipment
PE50 Plasma Etch Model
Model:
Plasma Etch, Inc. held several patents to the invention, development and manufacturing of groundbreaking innovations which have paved the way for plasma technology and the enhancement of quality manufacturing everywhere. These patented features have been a unique asset to the Plasma Etch, Inc. product line. Our equipment is industry proven and sets the standard for reliability, speed and uniformity in plasma processing.
Overview
The Plasma Etch, Inc. PE-50 is our entry level plasma system and offers many features not found in competitive units. This system is made for smaller roduction facilities, R&D, facilities and universities. The system features an implosion proof 6"w x 7"d x 4"h Rectangular welded Aluminum Vacuum Chamber and a direct powered RF electrode.
BENEFITS
SYSTEM FEATURES
APPLICATIONS
The Plasma Etch, Inc. PE-50 is our entry level plasma system and offers many features not found in competitive units. This system is made for smaller roduction facilities, R&D, facilities and universities. The system features an implosion proof 6"w x 7"d x 4"h Rectangular welded Aluminum Vacuum Chamber and a direct powered RF electrode.
BENEFITS
- Direct RF contact (capacitive parallel plate) is used for uniform plasma generation
- Equipped with PLC control, Full Automation Plasma Cleaning machine
SYSTEM FEATURES
- Welded Aluminum Vacuum Chamber, 6" W x 7" D x 4" H
- Single 4.5" x 6" horizontal Electrode
- 150 Watts @ 50 kHz R.F. Generator Optional 400 Watt Power Supply.
- Precision Needle Valve Flow Control 0-25 CC/Min
- Pirani Vacuum Gauge 0-1 Torr
- 5 CFM Oxygen Service Vacuum Pump
- Single Process Sequence
APPLICATIONS
- Plasma sterilization
- Surface modification