The Plasma Etch, Inc. PE-75 is our largest entry level plasma system and offers many features not found in competitive units.This system features a circular aluminum vacuum chamber that is 12&rdquo in diameter and 11&rdquo deep with a direct powered RF electrode. As in all Plasma Etch Systems, a capacitive parallel plate design is used for the most effective plasma generation.The compact size and affordability of the PE-75 makes this system perfect for smaller production facilities, R&D facilities, and universities.