BENEFITS
  • Offer custom electrode configurations including RIE (Reactive Ion Etch) and process temperature control.
  • Aluminum chamber features over 240 square inches of active processing surface with the three level standard configurations.
 
SYSTEM FEATURES
  • 12" X 12" X 12" Welded Aluminum Vacuum Chamber
  • Three 9" x 9" electrode &ldquoshelves&rdquo on 3&rdquo spacing
  • 300 Watt RF generator @ 100khz
  • One O-50cc Mass Flow Controller
  • Pirini Vacuum Gauge. Range 0-1 Torr
  • Microprocessor Control System with Touch Screen, single process
  • Vacuum Pump, Oxygen Service 8 CFM
  • 8 CFM Oxygen service Vacuum pump with mist eliminator
 
Option
  • 300 Watt Generator @ 13.56 MHZ
  • Electrostatic Shielding of chamber
  • Process Temperature Control
  • Custom Electrode configurations
  • RIE (Reactive Ion Electrode)
  • Nitrogen or CDA Purge on Vacuum pump
 
APPLICATIONS
  • Plasma sterilization
  • Surface modification