PE Plasma Clean Etch Equipment
PE100 Plasma Etch Model
Model:
The PE-100 is a complete system with vacuum pump designed to be robust and reliable yet inexpensive enough to allow startup companies, medical labs and R&D facilities the opportunity to experience Plasma Etch technology.. The clean design features an industrial powder coated frame to guard your processing environment from contamination. Cleaning with Plasma yields increased uniformity of any surface treated and reduces or eliminates unwanted and often expensive chemical waste. Operation is through a simple to use, intuitive touch screen interface and offer safe and repeatable processes
BENEFITS
SYSTEM FEATURES
Option
APPLICATIONS
- Offer custom electrode configurations including RIE (Reactive Ion Etch) and process temperature control.
- Aluminum chamber features over 240 square inches of active processing surface with the three level standard configurations.
SYSTEM FEATURES
- 12" X 12" X 12" Welded Aluminum Vacuum Chamber
- Three 9" x 9" electrode &ldquoshelves&rdquo on 3&rdquo spacing
- 300 Watt RF generator @ 100khz
- One O-50cc Mass Flow Controller
- Pirini Vacuum Gauge. Range 0-1 Torr
- Microprocessor Control System with Touch Screen, single process
- Vacuum Pump, Oxygen Service 8 CFM
- 8 CFM Oxygen service Vacuum pump with mist eliminator
Option
- 300 Watt Generator @ 13.56 MHZ
- Electrostatic Shielding of chamber
- Process Temperature Control
- Custom Electrode configurations
- RIE (Reactive Ion Electrode)
- Nitrogen or CDA Purge on Vacuum pump
APPLICATIONS
- Plasma sterilization
- Surface modification