BENEFITS
  • Direct RF contact (capacitive parallel plate) is used for uniform plasma generation
  • Equipped with PLC control, Full Automation Plasma Cleaning machine 
SYSTEM FEATURES
  • Welded Aluminum Vacuum Chamber, 5&rdquo X 8&rdquo Deep
  • Single 3.5&rdquo X 7&rdquo Horizontal Electrode
  • 150 Watts @ 50 KHz R.F. Generator Optional 400 Watt Power Supply.
  • Precision Needle Valve Flow Control 0-25 CC/Min
  • Thermocouple Vacuum Gauge, 0-1 Torr
  • Automated PLC Microprocessor
  • Console Dimensions: 14&rdquoW x 14.5&rdquoD x 18&rdquoH
  • Shipping Weight Approximately 52lbs
APPLICATIONS
  • Plasma sterilization
  • Surface modification