PE Plasma Clean Etch Equipment
PE2000R Plasma Etch Model
Model:
Built as an extension of our MK-II platform, it offers you the same repeatability, reliability and long life, as well as low maintenance costs. The reactive ion etch electrode offers the highest directional plasma effect. Etching with our roll to roll plasma etcher in the large aluminum chambers accommodate a generously sized active processing surface located between the feed and take up spools.The PE-2000R Roll to Roll plasma system is specially fitted with a continuous feed drive and take up system to accommodate continuous flexible substrates and roll/reel mounted materials. Our Reel-to-Reel plasma system can accept web widths of 2" to 24" with spindle diameters of 10"..
BENEFITS
Our standard vacuum pump is especially prepared for oxygen service. It is fully equipped with an N2 purge system, preventing any corrosive end products forming in the pump thus extending the service life and reducing the maintenance cycle. Processing your spooled product, whether they be small or large, PTFE, polyamide or Rigid-Flex Circuits, you will find that all are evenly etched and cleaned by the PE-2000R, ready for the next step in production. Our simple to use, intuitive touch screen interface has control over every aspect of the plasma etching process ensuring reliability and repeatability. The PE-2000R reel to reel plasma system is generally used to plasma treat rolls of material. The transport comes complete with a braking system, tensioning controls and speed controls. A dual computer operating system keeps track of plasma parameters and operations while the other maintains transport parameters. The system footprint will vary according to transport configuration.
SYSTEM FEATURES
Option
Our standard vacuum pump is especially prepared for oxygen service. It is fully equipped with an N2 purge system, preventing any corrosive end products forming in the pump thus extending the service life and reducing the maintenance cycle. Processing your spooled product, whether they be small or large, PTFE, polyamide or Rigid-Flex Circuits, you will find that all are evenly etched and cleaned by the PE-2000R, ready for the next step in production. Our simple to use, intuitive touch screen interface has control over every aspect of the plasma etching process ensuring reliability and repeatability. The PE-2000R reel to reel plasma system is generally used to plasma treat rolls of material. The transport comes complete with a braking system, tensioning controls and speed controls. A dual computer operating system keeps track of plasma parameters and operations while the other maintains transport parameters. The system footprint will vary according to transport configuration.
SYSTEM FEATURES
- Electrode Levels Horizontal Directional RIE (Reactive Ion Etch)
- Electrode Configuration 72&rdquo Horizontal Planar
- R.F. Generator & Matching Network 3000 Watts
- Patented Process Temperature Control 125 F to 300 F
- Mass Flow Controller, 2 Channels 0-2000 CC/Min
- Low Gas Alarms Up to 4 Channels
- Vacuum Gauge 0-10 Torr
- Microprocessor System Touch Screen Control/Multiple Sequence Storage
- Vacuum Pump, Oxygen Service 59 CFM
- Vacuum Pump Booster Blower 355 CFM
- Oil Filtration, Vacuum Pump 3 Microns
- Automatic N2 Purging, Vacuum Pump
- Controlled Rate N2 Chamber Purging Controlled Rate N2 Chamber Purging
- Oil Mist Eliminator
- Process Sequence Dual
- Transport Features
- Open Loop Tension Control Drive Motor with Particle Clutch
- Closed Loop Speed Control Ferrofluidic Vacuum Feed Through
- Footage Count, Line Speed, Tension Set Point Manual or Automatic with Jog/Speed Control
Option
- Computer Control System w/ Touch Screen Data Reporting, Event Viewing, Printer
- Signal Light Tower
- Dry Vacuum Pump 79/355 CFM
- Throttle Vacuum Controller
- Mass Flow Controllers Up to 4 Channels
- Custom Chambers and Electrodes Per Customer Specifications
- Surface modification